SPP TECHNOLOGIES CO., LTD.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 12350
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 992
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 5123
 
  
 
B05C APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 144
 
  
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 157
 
  
 
C01B NON-METALLIC ELEMENTS; COMPOUNDS THEREOF178
 
  
 
F27D DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE 124
 
  
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 1158
 
  
 
H05H PLASMA TECHNIQUE 129

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2016/0358,748 Plasma Processing Apparatus and Coil Used ThereinMar 31, 14Dec 08, 16[H01J, H05H]
2016/0153,091 Heating Device and Plasma Processing Apparatus Provided TherewithMar 31, 14Jun 02, 16[C23C]
2016/0118,225 Plasma Processing Apparatus and Opening and Closing Mechanism used thereinMar 31, 14Apr 28, 16[H01J]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9123542 Plasma etching methodAug 16, 12Sep 01, 15[H01L]
9117660 Apparatus, method and program for manufacturing nitride filmMay 22, 12Aug 25, 15[C23C, H01L]
8859434 Etching methodJul 11, 11Oct 14, 14[H01L]
8852388 Plasma processorFeb 26, 08Oct 07, 14[H01J, C23C, H01L]
8771461 Plasma processing apparatusDec 03, 08Jul 08, 14[C23C, H01L]
8673781 Plasma etching methodSep 06, 10Mar 18, 14[H01L]
8628676 Plasma etching methodMay 25, 11Jan 14, 14[H01L]
8598049 Deposition methodNov 25, 10Dec 03, 13[H01L]
8546265 Method, apparatus and program for manufacturing silicon structureApr 08, 09Oct 01, 13[H01L, B81C]
8518283 Plasma etching method capable of detecting end point and plasma etching device thereforJul 27, 07Aug 27, 13[G01R]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2015/0170,883 Plasma Etching DeviceAbandonedSep 25, 13Jun 18, 15[H01J, H01L]
2012/0276,746 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICEAbandonedApr 27, 11Nov 01, 12[H01L, C23F]
2012/0006,490 Plasma Etching ApparatusAbandonedDec 10, 09Jan 12, 12[C23F]
2011/0303,365 Plasma Etching ApparatusAbandonedJul 16, 10Dec 15, 11[H05H, C23F]
2011/0143,307 STENT, A REPRODUCING METHOD USING THE STENT, AND A METHOD FOR POSITIONING A WIREAbandonedMar 24, 09Jun 16, 11[A61C]
6939409 Cleaning method and etching methodExpiredDec 18, 00Sep 06, 05[0000]
6913653 Cleaning and etching methods and their apparatusesExpiredDec 17, 01Jul 05, 05[B08B]

Top Inventors for This Owner

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